New Family of Organometallic Single source precursors for Inorganic Films, Coatings, and Powders
RFT-65
A process for making aluminum oxide from single source precursors that have an aluminum to oxygen ratio of 2:3.
A new family of organometallic compounds was developed. These compounds contain a metal such as aluminum and a group 16 element such as oxygen in a stoichiometric ratio of 2:3 and can be decomposed to produce an inorganic compound such as A1203 (aluminum oxide), eliminating the organic portion of the original compound. Aluminum oxide is the only material developed to date under this program, although it may be expanded to other very useful compounds.
The advantages of the invention include the relatively innocuous nature of the precursor compound and the effluent organic compounds generated during decomposition and the low temperature of decomposition (less than 100°C).
Downloads
File: rft-065.pdf
Inquiries
Joy Goswami
Licensing Associate
NDSU Research Foundation
1735 NDSU Research Park Drive, Suite 124
Fargo, North Dakota 58105-5002
(701) 231-7886 Work
(701) 231-6661 Fax
Email: jaideepgoswami@ndsurf.org