Advances in the Deposition of Amorphous Silicon Films and Printed, Flexible Electronic Circuits
RFT-39
This patented technology provides a compound and process useful in the production of amorphous silicon films, such as those used in photovoltaic applications, as well as in the creation of printed, flexible electronic circuits. The technology involves a process of producing compounds containing a tetradecachlorocyclohexasilane dianion. These compounds are prepared by contacting trichlorosilane with a reagent composition comprising a tertiary polyamine. The resulting dianion can be chemically reduced to liquid cyclohexasilane (CHS), a stable compound useful in the silicon-based industries described herein.
Downloads
File: rft-39es.pdf
Inquiries
Jonathan L. Tolstedt
Licensing Associate/Patent Agent
NDSU Research Foundation
Fargo, North Dakota
(701) 231-8173 Work
(701) 231-6661 Fax
http://www.ndsuresearchfoundation.org/