A Novel Method to Create a Useful Compound for the Deposition of Amorphous Silicon Films
RFT-39
This technology involves a process of producing compounds containing a tetra-dedachloro-cyclohexa-silane dianion. They are prepared by contacting trichlorosilane with a reagent composition comprising a tertiary polyamine. The resulting tetradecachlorocyclohexasilane dianion can be chemically reduced to cyclohexasilane, a compound useful in the deposition of amorphous silicon films. One potential application involves use as a feedstock material for semiconductor wafers and photovoltaics.
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File: rft-39.pdf
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Jonathan L. Tolstedt
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